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  2019, Vol. 32 Issue (9): 855-866    DOI: 10.16451/j.cnki.issn1003-6059.201909010
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Robust Face Sketch Synthesis Based on Deep Probabilistic Graphical Models
ZHANG Yuqian1, GAO Fangyuan2, WANG Nannan1
1.State Key Laboratory of Integrated Services Networks, Xidian University, Xi′an 710071
2.Institute of Mathematics and Systems Science, Beihang University, Beijing 100191

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Abstract  Since pixel level features in the data-driven face sketch synthesis algorithms lack robustness to illumination variation and complex background, the quality of synthesized face sketches is poor. In this paper, a robust face sketch synthesis algorithm based on deep probabilistic graphical models is proposed. A preprocessing method is adopted to adjust illumination brightness and face pose of an input photo to make them consistent with the training photos. Instead of pixel feature, deep feature representation is utilized for neighbor selecting. A deep probabilistic graphical model is employed to jointly model the weight of sketch reconstruction and the weight of deep feature, and therefore the best reconstruction representation of the synthetic image is obtained. A fast nearest neighbor search method is proposed to speed up sketch synthesis. Experimental results verify robustness and rapidity of the proposed algorithm.
Key wordsFace Sketch Synthesis      Robust Preprocessing      Deep Probabilistic Graphical Model      Fast Neighbor Search     
Received: 15 May 2019     
ZTFLH: TP 391.4  
Fund:Supported by National Natural Science Foundation of China(No.61876142)
Corresponding Authors: WANG Nannan, Ph.D., professor. His research interests include computer vision, pattern recognition and machine learning.   
About author:: ZHANG Yuqian, master student. Her research interests include computer vision, pa-ttern recognition and machine learning;GAO Fangyuan, undergraduate student.
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ZHANG Yuqian,GAO Fangyuan,WANG Nannan. Robust Face Sketch Synthesis Based on Deep Probabilistic Graphical Models[J]. , 2019, 32(9): 855-866.
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http://manu46.magtech.com.cn/Jweb_prai/EN/10.16451/j.cnki.issn1003-6059.201909010      OR     http://manu46.magtech.com.cn/Jweb_prai/EN/Y2019/V32/I9/855
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